We demonstrate a simple route for fabricating trench-type copper patterns by combining a photo-lithography with a wet etching process. Nanostructured CuO was grown on the patterned Cu current collectors via a simple solution immersion process. And silicon nanoparticles were filled into the patterned Cu current collectors. The strongly immobilized CuO on the patterned Cu exhibited high electrochemical performance, including a high reversible capacity and a high rate capability.
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Choi et al. (2012) studied this question.
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