The reflection high-energy electron diffraction (RHEED) intensity level behavior during the growth of AlxGa1−xAs/GaAs quantum wells (QWs) is compared to the photoluminescence characteristics. The correlation between a decrease of the RHEED intensity level and the linewidth broadening of the excitonic QW transitions allows the unambiguous association of such a decrease with a roughening of the growth interface.
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Deparis et al. (1990) studied this question.
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