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Thin films were made by spinning a dispersion of tin-doped indium oxide particles, having an average diameter of 14 nm, onto glass substrates. As-deposited thin films displayed a resistivity ρ of 0.3 Ω m and some optical absorption. Annealing in vacuum at 200–400 o C for 2 h, and subsequently in air at 500 o C for 2 h, produced films with ρ ≈ 10 −3 Ω m and a visible transmittance exceeding 90%. Leaving out the vacuum treatment yielded higher resistivity.
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Ederth et al. (2002) studied this question.
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