Diffusional Properties of the Stage-III Defect in Copper. II. A Model for Defect-Dislocation Interactions

Using the experimental results given in Part I as a guide, a linear model is developed in this Part which describes the interaction of a lattice defect and a dislocation. It is supposed in this model that the defect is free to diffuse between existing (or in-grown) traps such as jogs or dislocation nodal points, and that if the defect is trapped, dislocation climb follows. From a comparison of the results given in Part I and the predictions of the model, values for the ``pipeline'' diffusivity and the strength of the binding of the defects to the in-grown nodal points may be obtained. The numbers so obtained are consistent with values evolved from other techniques for studying atom motions. An estimate for diffusional jog-pair energies is also given.