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Synchrotron radiation scanning photoemission spectroscopy has been used to study thin platinum silicide layers produced by pulsed-laser annealing of vacuum deposited Pt films on Si(001). High-resolution photoemission measurements on the Pt 4f and Si 2p core lines were used to evaluate morphological changes and interfacial reactions. Distinct regions were identified with varying PtSi thickness and mixed Pt-rich silicides. The lateral distribution and the chemical phases formed within the laser-irradiated spots indicate that the local laser-induced temperature rise controls the interfacial processes.
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Nelson et al. (2002) studied this question.
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