Toward Molecular Electronic Circuitry: Selective Deposition of Metals on Patterned Self-Assembled Monolayer Surfaces

We have developed a simple, robust method by which to construct complex two-dimensional structures based on controlling interfacial chemistry. Our approach is to employ UV-photopatterning and the reaction of vapor-deposited metals with self-assembled monolayers. To demonstrate the method, we have selectively vapor-deposited Mg on a patterned -CH3/-COOH-terminated alkanethiolate surface. The deposited metal penetrates through the -CH3 SAM to the Au/S interface while reacting with and accumulating on top of the -COOH SAM. This work has important applications in molecular/organic electronics, sensing, and other technologies. Our method has many advantages: it is extensible to many different materials, easily parallelized, affords precise nanoscale placement, and is fully compatible with photolithography.