Conditions for the preparation of electrochromic tungstic oxide films with high efficiency for coloration have been investigated. Tungstic oxide films were deposited on glass substrates by rf sputtering in Ar-O2 mixture from a compressed powder WO3 target. As-deposited films require an ‘‘aging process,’’ in which the density of charges extracted in bleaching is smaller than that injected in coloring. It is considered that a part of the protons introduced during the aging combine with bonds of unstable oxygen contained in the as-deposited films. After the aging period, sputtered films have reversible coloration and bleaching cycles. Maximum electrochromic coloration efficiencies are 0.09 and 0.04 cm2/mC at wavelengths of 800 and 500 nm, respectively. They are obtained when the sputtering atmosphere is 0.04–0.05-Torr total pressure and 5% oxygen content. At any rate, substrate temperature should be kept at 100 °C or less.
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Tatsuoka et al. (1987) studied this question.
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