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March 1, 1986Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Arsenic-induced intensity oscillations in reflection high-energy electron diffraction measurements

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Authors

BLB. LewisYale UniversityRFR. FernandezLockheed Martin (United States)AMA. MadhukarUniversity of Southern California

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Cite This Study

Lewis et al. (1986) studied this question.

synapsesocial.com/papers/6a9175b69ea92d4f71f08532https://doi.org/10.1116/1.583432
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