Cinnamoyloxymethyl dimethyl vinyl silane was synthesized and bound to a series of commercial polydimethylsiloxane‐type copolymers bearing variable amounts of SiH functions through a hydrosilylation reaction. This reaction was controlled in order to avoid side reactions between the photosensitive unsaturated moiety and the SiH groups. The photosensitivity of polymeric films was studied by a photoresist test described in previous papers. The results emphasize the role of the molecular weight of the starting copolymer and the percentage of pendant photosensitive groups.
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Lemaitre et al. (1987) studied this question.
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