We have prepared iron nitride thin films by reactive rf sputtering of an iron target in an argon-nitrogen plasma. The films present a wide variety of structures and compositions: α expanded bcc iron, amorphous Fe1−x-Nx, γ′-Fe4N, ε-Fe2–3N, and ζ-Fe2N. Evolutions of the crystallographic structures and of the magnetic properties of the obtained phases are discussed versus the nitrogen concentration in the gaseous flow and the substrate temperature during deposition.
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Bobo et al. (1995) studied this question.
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