Ten-Nanometer Dense Hole Arrays Generated by Nanoparticle Lithography

Large area dense hole arrays with a feature size of ~10 nm were generated using self-assembled monolayers of nanoparticles as etch masks. To fabricate the hole arrays, monolayers of nanoparticles were irradiated by electron beam to turn surfactants into amorphous carbon, treated by acid to remove the nanoparticle cores, and then etched by CF(4) to deepen the holes. Evaporated gold films preferentially diffuse into the holes to generate gold nanoparticle arrays. However no obvious diffusion into holes was observed for a sputtered iron platinum film.