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Patterned hydrogen silsesquioxane films have been used as templates for directed metallization of nonconductive discontinuous surfaces. Exposure of the surface to palladium(II) or silver(I) salt solutions results in silyl hydride site selective palladium or silver metal deposition on the HSQ exposed regions. This site-specific metal seed layer has been successfully used as a catalyst for the deposition of copper and silver films by electroless metallization processes.
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Harkness et al. (2002) studied this question.
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