The work-function of MoS2 interfacial layers can be efficiently modulated by p- and n-doping treatments. As a result, the PCE of devices with a p-doped MoS2-based HTL is increased from ∼2.8 to ∼3.4%. Particularly, after n-doping the PCE was dramatically increased due to the change in work-function compared with un-doped MoS2 thin-films.
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Noh et al. (2013) studied this question.
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