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An atomic-scale model for the kinetics of intermixing of GaAs/AlGaAs, quantum confined heterostructures is presented. It quantifies the effects of the statistical nature of defect diffusion through heterostructures on the Ga/Al interdiffusion across such an interface. The model has been validated by successfully predicting the observed amounts of quantum well intermixing induced by a hydrogen plasma induced defect layer intermixing process. Agreement within 30% of the measurements was obtained for values of the surface release velocity>1 μm s1.
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Helmy et al. (1997) studied this question.
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