The fabrication of arrays of Schottky diodes on p-type silicon is described using a representative soft lithographic technique: micromolding in capillaries (MIMIC). It is demonstrated that soft lithography is compatible with multilayer fabrication of electronically functional structures. The characteristics of the diodes were found to be similar to those fabricated by photolithography. The advantages and limitations of MIMIC are outlined, with particular attention being paid to the degree of registration of features that can be achieved.
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Hu et al. (1998) studied this question.