Lithographic patterning of micrometer scale structures in films of polythiophene, an organic material with good linear and nonlinear χ(3) optical properties, has been accomplished by two methods: direct deposition of polythiophene in SiO2 trenches and an oxygen plasma etch of polythiophene through a spin-on glass mask.
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Kutsche et al. (1993) studied this question.
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