Generation of Ni–Si 3 N 4 nanocomposites by DC, PC and PRC electrodeposition methods

Ni–Si 3 N 4 nanocomposite thin films were fabricated by direct current (DC), Pulse current (PC) and Pulse reverse current (PRC) electrodeposition methods. The structure and surface morphology of thin films were analysed by XRD, Scanning Electron Microscopy and Atomic Force Microscope. Corrosion protection performance of the Ni–Si 3 N 4 nanocomposite on mild steel in 3.5% NaCl corrosive medium was assessed by electrochemical method. Texture coefficient and microhardness of the thin films were determined and discussed. Comparisons and performance of corrosion resistance of these coatings obtained by DC electrodeposition, PC electrodeposition and with PRC electrodeposition were investigated.