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January 1, 1985Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

X-ray zone plates fabricated using electron beam lithography and reactive ion etching

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Authors

HAHiroaki AritomeThe University of OsakaHAHirofumi AokiShiseido Group (Japan)SNS. NambaThe University of Tokyo

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Aritome et al. (1985) studied this question.

synapsesocial.com/papers/6a93129fed3dcef77b7a6dc6https://doi.org/10.1116/1.583242
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