Viscosity tuning of preceramic polymers, in order to adapt them to various applications, has been elaborated by the authors. Thermal and photochemical crosslinking adjusts the viscosity of the polyureasilazane Ceraset in the range from 0.05 up to 20 Pas; the low viscous Ceraset can be used for the reaction molding of microstructured components. Other polymers (NCP200 and ABSE) are potential negative resist materials for photolithography and deep X-ray lithography.
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Hanemann et al. (2002) studied this question.
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