Electron beam annealing of selenium-implanted gallium arsenide

The multiply scanned electron beam method has been applied to annealing selenium implanted gallium arsenide. The conditions necessary to give good electrical activation and mobility have been established for doses from 5×1012 to 1×1014 ions cm−2. Partial activation was achieved in uncapped samples for doses of 1×1013 cm−2 and greater. However, to achieve higher activation of these doses, and significant activation of low doses, encapsulation with Si3N4 was necessary. It is shown that rapid electron beam annealing lasting only a few seconds gave equivalent results to conventional furnace annealing methods.