Scattering near-field scanning optical microscopy (s-NSOM) has been developed to characterize optical near field with spatial resolution on the order of 10 nm. In this work we report investigation of the interferometric patterns commonly occurred in s-NSOM measurements. To reveal the origin of such interference patterns, a simple nanoslit is used. Comparing the measured result with a simplified analytical model as well as full-field numerical simulations, it is shown that the interference pattern is predominantly formed by the in-plane component of incidence light and surface plasmon polariton (SPP) launched by the nanoslit. This result helps to understand the responses of plasmonic nanostructures during s-NSOM measurements.
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Li et al. (2014) studied this question.
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