The heteroepitaxial growth of ZnSe on GaP and GaAs substrates

Single-crystal layers of ZnSe have been grown on GaP and GaAs substrates in a hydrogen transport system. By the use of the H2 bypass flow, the growth rate versus substrate temperature characteristics are found to be modified. The growth on GaP (111)B substrates is limited by thermodynamic mass transport and that on GaP (100) substrates by the kinetics of the surface chemical reaction. ZnSe layers grown on the GaAs (100) face have larger growth rates and smoother surface morphologies than those on GaP (100). This result may originate from the lattice parameter mismatch between the epitaxial layers and the substrates.