In-doped ZnSe layers have been grown for the first time by low-pressure vapor-phase epitaxy using metallic Zn, Se and In as source materials on GaAs(100) substrates. The carrier concentration increases significantly with increasing In cell temperature, and is controlled in the range of 1016∼1018 cm-3. The near-band-gap emission also increases with In cell temperature. The highest carrier concentration achieved is 1.3×1018 cm-3, and even the most highly doped sample shows a photoluminescence spectrum dominated by the near-band-gap emission.
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Matsumoto et al. (1987) studied this question.
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