Chemical sputtering of nickel oxide and carbide by low energy (5–200 eV) C+ and O+ beams

Recombination of carbon and oxygen on a Ni(111) surface has been studied by low energy (5–200 eV) reactive ion bombardment (RIB). The reactions O++NiC(s) and C++NiO(s) both result in efficient removal of the surface carbon and oxygen, respectively. Removal of the adspecies occurs most efficiently at low kinetic energies and the rate of sputtering decreases with increasing kinetic energy. Energy dissipation into the solid appears to be insufficient for stabilization of the molecular CO product as a surface adsorbate.