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The most effective way to design VLSI device structures is to use sophisticated, complex two-dimensional (2D) and three-dimensional (3D) models. This paper and its companion [1] discusses the numerical simulation of such device models. Here we describe the basic semiconductor equations including several choices of variables. Our examples illustrate results obtained from finite-difference and finite-element implementations. We stress the necessary 3D calculations for small-size MOSFET’s. Numerical results on inter-electrode capacitive coupling are included.
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Fichtner et al. (1983) studied this question.
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