The surface stress was evaluated employing a composite elastic model using the first-principles full-potential linearized augmented plane-wave (FP-LAPW) method for 5, 7 and 9 monolayer (ML) Mo(001) thin films. The surface stress calculated from previously derived slope and curvature methods yields a very similar result. The surface stress is found to vary with the number of the Mo thin film layers. This variation is found to be consistent with the existence of quantum well states in these thin films.
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Qian et al. (2005) studied this question.
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