ADVERTISEMENT RETURN TO ISSUECommunication to the...Communication to the EditorNEXTPhotopatternable Metallopolymers: Photo-Cross-Linking and Photolithography of Polyferrocenylsilane MethacrylatesPaul W. Cyr, David A. Rider, Kevin Kulbaba, and Ian MannersView Author Information Department of Chemistry, University of Toronto, 80 St. George St., Toronto, Ontario M5S 3H6, Canada Cite this: Macromolecules 2004, 37, 11, 3959–3961Publication Date (Web):April 27, 2004Publication History Received12 December 2003Revised4 March 2004Published online27 April 2004Published inissue 1 June 2004https://pubs.acs.org/doi/10.1021/ma035895phttps://doi.org/10.1021/ma035895prapid-communicationACS PublicationsCopyright © 2004 American Chemical SocietyRequest reuse permissionsArticle Views619Altmetric-Citations31LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstract
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Cyr et al. (2004) studied this question.
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