We report the study of the real-time evolution of tunneling magnetoresistance (TMR) in CoFeB∕MgO∕CoFeB junctions during annealing at 380°C. The TMR quickly developed at the early stage of the annealing, with 200% magnetoresistance observed in less than 10min, followed by a slow approach to saturation. This evolution of TMR was correlated with the structural changes, including crystallization of amorphous CoFeB electrodes and improvement of barrier quality during the annealing.
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Wang et al. (2008) studied this question.
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