Point-defect arrays embedded in self-assembled silica colloidal photonic crystals (see Figure) have been fabricated using a combination of conventional “top–down” nanoimprinting lithography with “bottom–up” self assembly. The relative locations of the point defects in the structure can be precisely controlled. These structures may find use in technological applications such as low-threshold lasers and light-emitting diodes.
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Yan et al. (2005) studied this question.
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