Deep level defects in Mg-doped, p-type GaN grown by metalorganic chemical vapor deposition

Deep level defects in Mg-doped, p-type GaN were characterized by deep level transient spectroscopy (DLTS) and photoemission capacitance transient spectroscopy (ODLTS). The measurements were conducted on n+-p junction diodes grown by metalorganic chemical vapor deposition. DLTS revealed discrete deep levels in the lower half of the band gap with activation energies for hole emission of 0.21, 0.39, and 0.41 eV. While DLTS is able to detect deep levels only in the proximity of the valance band edge in p-type, wide band-gap semiconductors, ODLTS enables detection of deep levels throughout the band gap of GaN. The ODLTS spectrum of Mg-doped, p-type GaN is dominated by a deep level with an optical threshold energy for photoionization of ∼1.8 eV. This deep level, which appears to be energetically located near midgap is present in the highest concentration (∼2.4×1015 cm−3) among the deep levels detected in our GaN material. None of the detected deep levels is present in sufficient concentration to significantly compensate the shallow acceptor dopant in our Mg-doped, p-type GaN.