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We show how we can measure with accuracy the distribution law of thicknesses deposited inside a vacuum chamber. These measurement techniques are applied to the simultaneous production of high rejection narrowband multiple halfwave Fabry-Perot filters. To prevent any alteration of the filters' optical properties, we must control the variations vs time of the evaporant distribution.
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Grèzes-Besset et al. (1989) studied this question.
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