X-ray photoelectron emission microscopy in combination with x-ray magnetic circular dichroism investigation of size effects on field-induced Néel-cap reversal

X-ray photoelectron emission microscopy in combination with x-ray magnetic circular dichroism is used to investigate the influence of an applied magnetic field on Néel caps (i.e., surface terminations of asymmetric Bloch walls). Self-assembled micron-sized Fe(110) dots displaying a moderate distribution of size and aspect ratios serve as model objects. Investigations of remanent states after application of an applied field along the direction of Néel-cap magnetization give clear evidence for the magnetization reversal of the Néel caps around 120mT, with a ±20mT dispersion. No clear correlation could be found between the value of the reversal field and geometrical features of the dots.