Irradiation of 2,2‐bis‐(4‐hydroxyphenyl)‐propane (bisphenol‐A) with UV light causes photo‐decomposition of the compound. Spin‐trapping with α‐phenyl‐N‐tert‐butyl‐nitrone showed that free radicals were cleaved from the molecule. No direct ESR‐spectroscopic information concerning the structure of the remaining radical skeleton could be obtained. Gas chromatographic mass spectrometric analysis of the decomposition products indicated the existence of a semiquinone structure following cleavage of a methyl radical from 2,2‐bis‐4–(hydroxyphenyl)‐propane. The capacity of 2,2‐bis‐(4‐hydroxyphenyl)‐propane to give rise to radicals might explain its photoallergenic properties.
No takes yet. Share an insight, caveat, or question.
Peltonen et al. (1986) studied this question.
Synapse has enriched one closely related paper. Consider it for comparative context: