Spectroscopic ellipsometry was used to rapidly and nonde‐ structively characterize ion‐plated SiO 2 and Ta 2 O 5 films on glass substrates as a function of temperature. The analysis provided the density (as a function of depth) and optical properties of the films. The SiO 2 film had a higher refractive index than is typical for thermally grown SiO 2 . This was attributed to compaction of the film during the deposition process. Similarly, the ion‐plated Ta 2 O 5 film had the high refractive index characteristic of a high‐density film. The films were not affected strongly by temperature during heating >100°C.
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Trolier‐McKinstry et al. (1995) studied this question.