Atmospheric pressure chemical vapor deposition of SiO2‐TiO2 antireflective films from [tri‐(tert‐butoxy)siloxy‐tri‐(tert‐butoxy)]titanium, [tC4H9O]3Si‐O‐Ti[OtC4H9]3, which is a single source alkoxide precursor

Antireflective SiO2‐TiO2 films have potential applications in the automotive industry provided an economical method can be found to produce high‐quality films on a large scale. Following the discovery that alkoxides MOM' can be suitable single‐source precursors for the deposition of multicomponent oxides, the preparation of tC4H9O[3SiOTiOtC4H9]4 is described along with its application as a single‐source precursor for the deposition of SiO2 and TiO2 films via atmospheric‐pressure CVD.