Barrier Properties of Titanium Nitride Films Grown by Low Temperature Chemical Vapor Deposition from Titanium Tetraiodide, Faltermeier, Cheryl, Goldberg, Cindy, Jones, Michael, Upham, Allan, Manger, Dirk, Peterson, Gregory, Lau, Janice, Kaloyeros, Alain E., Arkles, Barry, Paranjpe, Ajit
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Faltermeier et al. (1997) studied this question.
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