ICP Etching of Silicon for Micro and Nanoscale Devices

I would like to dedicate this thesis to multiple people: Most importantly I dedicate this work to my wife Shaleigh. I also dedicate this work to the scientists and engineers who have invested much of their time to mentor, teach, and inspire me: Stuart Shacter, Brian Anderson, Axel Scherer, and especially Mike Henry – my Father. Finally, I dedicate this work to my sisters Lara, Gina, and Ann. LIST OF PUBLICATIONS iv · M.D. Henry, M. Shearn, A. Scherer, Ga Beam Lithography for Nanoscale Silicon Reactive Ion Etching, Nanotechnology, 21 (2010).