Photoluminescence of Ge(Si) self-assembled islands embedded in a tensile-strained Si layer

We report photoluminescence (PL) studies of Ge(Si) self-assembled islands embedded into a tensile-strained Si layer grown on smooth relaxed Si0.75Ge0.25∕Si(001) buffer layers subjected to chemical-mechanical polishing. The intense PL from Ge(Si) islands embedded into a strained Si layer compared to the PL from islands grown on unstrained Si(001) is associated with efficient confinement of electrons in a strained Si layer on the heterojunction with islands. The observed dependence of the island PL peak position on thickness of strained Si layer confirms the validity of the model for real-space indirect optical transition between electrons confined in the strained Si layer, and holes localized in islands.