The fabrication of diffraction gratings of a chirped sampled gratings distributed reflector (CSG-DR) laser by nanoimprint lithography (NIL) has been demonstrated. The diffraction gratings with highly uniform linewidth and period have been successfully fabricated by the combination of the reverse-tone NIL and precise etching techniques. The CSG-DR laser fabricated by NIL shows a sufficiently wide tuning range of 40 nm as we designed. The results of this study indicate that our fabrication process for the sampled gratings utilizing the NIL technique has a high potential for the fabrication of a CSG-DR laser.
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Yoshinaga et al. (2014) studied this question.
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