A multistep procedure for creating nanohole‐patterned gold films (see Figure) is presented. The steps include the self‐assembly of metal‐loaded polystyrene‐block‐poly(2‐vinylpyridine) micelles on GaAs substrates, hydrogen gas plasma treatment, directional reactive ion etching, and gold sputtering. The size and separation of holes resemble that of the gold cluster pattern.
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Haupt et al. (2003) studied this question.
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