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We have developed an alternative self-assembly process to pattern different geometries with user-defined tunability across the micro and nanoscale. In this approach, field-induced assembly of colloidal magnetic nanoparticles within a microfluidic channel is used as a tunable mask for near-field lithography. We have fabricated dot arrays with controllable spacing and micro-ring patterns with 250 nm feature sizes. The proposed process is versatile, cost-effective, and scalable, presenting itself as a promising nanomanufacturing tool.
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Chang et al. (2009) studied this question.
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