Effect of boron on the deep donors (D X centers) in GaAs:Si

We found that, when boron was introduced into GaAs:Si, the deep donors induced by pressure exceeding 20 kbar reported previously by M. Mizuta, M. Tachikawa, H. Kukimoto, and S. Minomura [J. Appl. Phys. 24, L143 (1985)] disappeared while new donor levels with reduced binding energies and capture barrier heights appeared. It is proposed that B atoms paired up with Si donor atoms and the resultant change in the short-range potential of the Si donor atoms depressed the capture barrier height of the pressure-induced deep donor.