Two different commercially available photoresists, specifically designed for the fabrication of charge-coupled device (CCD) microlens arrays, are compared for their effectiveness in industrial-scale array production. A method is used to characterize resist films, prepared under the same processing conditions as those for the actual lens arrays. Great differences in the transmission spectra are observed between the two resists. Similarly, the quality of the film surface, based on the interference patterns in transmission spectra, vary greatly as well. Finally, plots of absorption versus wavelength offer practical proof that power losses due to absorption vary significantly between the types of photoresist.
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