Resonant wideband polarizer with single silicon layer

We present the design, fabrication, and characterization of a guided-mode resonance polarizer operating in the telecommunication band. This polarizer consists of a single one-dimensional silicon grating layer and a glass substrate. The device is designed using inverse mathematical methods and fabricated by thin-film deposition, holographic-interference patterning, and etching. The fabricated polarizer has high transmittance for transverse-magnetic polarization and low transmittance for transverse-electric polarization over a ∼200 nm wavelength range. Its experimental extinction ratio is ∼670:1 at a central wavelength λc=1563 nm. Experimental and theoretical results are in good agreement.