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Ultraflat nanopatterned surfaces can be created by combining the techniques of nanosphere lithography and ultraflat template stripping, as highlighted here. In this new method—ultraflat nanosphere lithography (UNSL)—nanostructures of one material are embedded in a matrix of a second material (see Figure). The feasibility of UNSL is demonstrated for several pairs of materials.
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Frey et al. (2000) studied this question.
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