A photosensitive complex between an organic substrate, 1,1,3,3-tetramethylurea (TMU), and the heteropoly acid, α-H3PMo12O40 of stoicheiometry [(TMU)2H]3PMo12O40, (1), has been characterized in solution and in the solid state; irradiation into the low energy absorption bands of (1) in solution or in the solid state results in the immediate photoreduction of the polyoxometallate by the TMU.
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Prosser-McCartha et al. (1986) studied this question.