We report an innovative approach that combines nanopatterning and nanomaterials synthesis with traditional silicon micromachining technologies for large-scale fabrication of carbon nanotube (CNT) probe tips for atomic force microscopy imaging applications. Our batch fabrication process has produced 244 CNT probe tips per 4-in. wafer with control over the CNT location, diameter, length, orientation, and crystalline morphology. CNT probe tips with diameters ranging between 40 and 80 nm and lengths between 2 and 6 μm are found to be functional probe tips with no need for shortening. This reliable and true bottom-up wafer scale integration and fabrication process provides a new class of high performance nanoprobes. Preliminary AFM imaging results show that the CNT probe tips are strong, wear-resistant, and capable of high-resolution and critical-dimension imaging.
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Ye et al. (2004) studied this question.
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