A p-type Si wafer covered with a SiO2 film is proposed as a recording medium. When an electron beam of 20 keV irradiates the wafer at a dosage of 2×10-7 C/cm2 or more, surface photovoltage decreases at the points irradiated by the electron beam. Thus, Roman characters recorded with the electron beam have been successfully interpreted with an improved flying-spot scanner.
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Munakata et al. (1981) studied this question.
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