Patterned monolayers of gold nanoparticles are selectively formed on Hf4+-modified silicon dioxide. The 1.5 nm diameter particles are functionalized with a phosphonic acid ligand shell and assembled from solution on a native oxide surface that has been patterned with Hf4+ ions, as shown in the Figure. This system integrates nanoscale components and lithographic patterning. The technique used is precise and compatible with other lithographic techniques.
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Foster et al. (2005) studied this question.
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