Answers are grounded in this paper and cite their sources.
Photoresist, a frequently used material in existing microfabrication processes, can be utilized in carbon micro electro mechanical system (C-MEMS) since the patterned carbon micro/nano structures can be formed by pyrolysis of a patterned photoresist.
No takes yet. Share an insight, caveat, or question.
Yin et al. (2016) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: